Title :
Using surface-plasmon effects to improve process latitute in near-field optical lithography
Author :
Arnold, Matthew D. ; Blaikie, Richard J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Canterbury Univ., Christchurch
Abstract :
Surface plasmon enhanced contact lithography uses an underlying plasmonic layer to enhance image quality in evanescent near-field optical lithography. This article details simulations aimed at finding optimum conditions and attempts to explain some underlying mechanisms. Parameters explored include resist thickness, metal permittivity and thickness, polarization, and grating period and duty-cycle
Keywords :
photolithography; resists; surface plasmons; evanescent near-field optical lithography; image quality; plasmonic layer; process latitude; surface plasmon enhanced contact lithography; surface-plasmon effects; Computational modeling; Finite element methods; Gratings; Image quality; Lithography; Optical sensors; Optical surface waves; Plasmons; Resists; Stimulated emission;
Conference_Titel :
Nanoscience and Nanotechnology, 2006. ICONN '06. International Conference on
Conference_Location :
Brisbane, Qld.
Print_ISBN :
1-4244-0453-3
Electronic_ISBN :
1-4244-0453-3
DOI :
10.1109/ICONN.2006.340675
