DocumentCode
2223787
Title
Development of a single ion detection system for the implantation of donors with nanoscale precision
Author
Hopf, T. ; Yang, C. ; Jamieson, D.N. ; Tamanyan, G. ; Andresen, S.E. ; Gauja, E. ; Dzurak, A.S. ; Clark, R.G.
Author_Institution
Sch. of Phys., Melbourne Univ., Vic.
fYear
2006
fDate
3-7 July 2006
Abstract
The authors have developed a technique which enables the implantation and detection of single low-energy (<15 kev) ions in a silicon substrate with nanoscale precision, and with a detection efficiency approaching 100%. The process is based on the collection of electron-hole pairs generated in the substrate by the ion impacts, and is currently being utilized for the construction of prototype quantum computer devices in the solid state.
Keywords
doping; ion implantation; quantum computing; silicon; IBIC; donor implantation; doping; electron-hole pairs; ion impacts; ion implantation; nanoscale precision; quantum computing; silicon substrate; single ion detection system; single low-energy ions; Aluminum; Australia; Detectors; Doping; Electrodes; Physics computing; Quantum computing; Silicon; Solid state circuits; Telecommunication computing;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoscience and Nanotechnology, 2006. ICONN '06. International Conference on
Conference_Location
Brisbane, Qld.
Print_ISBN
1-4244-0452-5
Electronic_ISBN
1-4244-0452-5
Type
conf
DOI
10.1109/ICONN.2006.340679
Filename
4143459
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