Title :
The selection and creation of the rules in rules-based optical proximity correction
Author :
Shi, Rui ; Cai, Yici ; Hong, Xianlong ; Wu, Weimin ; Yang, Changqi
Author_Institution :
Tsinghua Univ., Beijing, China
Abstract :
Considering the efficiency and veracity of rules-based OPC applied to recent large-scale layout, we firstly point out the importance of the selection and creation of rules in rules-based OPC. Our discussion addresses the crucial factors in selecting and creating rules as well as how we select and create more concise and practical rules-base. Based on our ideas we suggest four primary rules and as a result we show some rule data in table. The automatic construction of the rules-base called OPCL is an important part of the whole rules-based OPC software
Keywords :
circuit layout CAD; integrated circuit layout; photolithography; proximity effect (lithography); automatic construction; large-scale layout; optical lithography; rules creation; rules selection; rules-based OPC software; rules-based optical proximity correction; semiconductor manufacturing; semiconductor wafer; Costs; Geometrical optics; Integrated circuit layout; Large-scale systems; Lithography; Proximity effect; Robustness; Semiconductor device manufacture; Semiconductor device modeling; Shape;
Conference_Titel :
ASIC, 2001. Proceedings. 4th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-6677-8
DOI :
10.1109/ICASIC.2001.982496
