Title :
An object-based approach to optical proximity correction
Author :
Yang, Changqi ; Hong, Xianlong ; Wu, Weimin ; Cai, Yici ; Shi, Rui
Author_Institution :
Tsinghua Univ., Beijing, China
Abstract :
As the feature sizes of integrated circuits have been continually reducing to below exposure wavelength, some correcting techniques, such as OPC and PSM are indispensable to compensate for the distortions on wafer images. In this paper, we describe an object-based approach to OPC named OPCM, which is a model-based OPC tool. Also, a rule-based OPC has been adopted to enhance the practicability of the software
Keywords :
object-oriented methods; proximity effect (lithography); semiconductor process modelling; OPC; OPCM; distortions; exposure wavelength; feature sizes; object-based approach; optical proximity correction; practicability; wafer images; Computational modeling; Diffraction; Light scattering; Optical design; Optical distortion; Optical scattering; Resists; Semiconductor device modeling; Simulated annealing; Software libraries;
Conference_Titel :
ASIC, 2001. Proceedings. 4th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-6677-8
DOI :
10.1109/ICASIC.2001.982533
