DocumentCode :
2226321
Title :
Multi-layer low-temperature deposited CMOS photonics for microelectronics backend integration
Author :
Sherwood-Droz, Nicolás ; Lipson, Michal
Author_Institution :
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
fYear :
2011
fDate :
1-6 May 2011
Firstpage :
1
Lastpage :
2
Abstract :
We experimentally show vertically-stacked, multi-layer, low-temperature deposited photonics for integration on processed electronics. Waveguides, microrings, and crossings are fabricated out of 400°C PECVD Si3N4, in a two layer configuration.
Keywords :
CMOS integrated circuits; integrated optics; Si3N4; crossings; microelectronics backend integration; microrings; multilayer low-temperature deposited CMOS photonics; temperature 400 degC; two layer configuration; waveguides; CMOS process; Optical films; Optical imaging; Optical resonators; Optical waveguides; Photonics; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4577-1223-4
Type :
conf
Filename :
5950075
Link To Document :
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