Title :
Investigation of a high-current pulsed magnetron discharge initiated in the low-pressure diffuse arc plasma
Author :
Bugaev, S.P. ; Koval, N.N. ; Sochugov, N.S. ; Zakharov, A.N.
Author_Institution :
Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia
Abstract :
The paper presents the results of a study of a pulsed high-current magnetron discharge used for deposition of thin metallic films. The current-voltage characteristic of this type of discharge and its range of occurence have been investigated in relation to the magnetic field induction, the cathode material and the preionization plasma density. High-frequency oscillations of the voltage across the magnetron sputtering system caused by the repetitive variation in the conductance of the cathode-anode gap have been discovered. The achieved pulsed deposition rate for copper is 11 μm/min
Keywords :
copper; electric breakdown; magnetrons; metallic thin films; plasma density; plasma deposited coatings; plasma deposition; sputter deposition; sputtered coatings; vacuum arcs; vacuum breakdown; vacuum insulation; Cu; HF voltage oscillations; cathode material; cathode-anode gap conductance; high-current pulsed magnetron discharge; low-pressure diffuse arc plasma; magnetic field induction; magnetron sputtering; preionization plasma density; pulsed deposition rate; thin metallic film deposition; Cathodes; Conducting materials; Copper; Current-voltage characteristics; Magnetic fields; Magnetic films; Magnetic materials; Plasma density; Sputtering; Voltage;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
DOI :
10.1109/DEIV.1996.545530
