DocumentCode :
22274
Title :
Piezoresistive pressure sensors fabricated by surface micromachining process compatible with CMOS process
Author :
Huiyang Yu ; Ming Qin
Author_Institution :
Key Lab. of MEMS of Minist. of Educ., Southeast Univ., Nanjing, China
Volume :
49
Issue :
13
fYear :
2013
fDate :
June 20 2013
Firstpage :
827
Lastpage :
829
Abstract :
A piezoresistive pressure sensor has been fabricated with a newly proposed fabrication process, which is quite suitable for fabricating MEMS devices. The fabricated pressure sensors are wire-bonded and have been tested under the pressure range from 100-1012 hPa. The results show that the output voltage increases with the applied pressure. For the structures with membrane length of 800 and 900 μm, the output voltage is linear to the pressure applied and the sensitivity of the sensor is about 0.75 and 0.877 mV/hPa. The test results also show that, in order to get a linear output, the membrane length should be less than 1000 μm.
Keywords :
CMOS integrated circuits; micromachining; microsensors; piezoelectric devices; pressure sensors; CMOS process; MEMS devices; fabrication process; piezoresistive pressure sensors; pressure 100 hPa to 1012 hPa; sensor sensitivity; size 800 mum; size 900 mum; surface micromachining process; wire-bonding;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2013.1396
Filename :
6553042
Link To Document :
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