DocumentCode :
2228159
Title :
Coupling computation of the BEM and FDM in 3D capacitance extraction
Author :
Wei, Hongchuan ; Wang, Guanhui ; Wang, Zeyi
Author_Institution :
Dept. of Comput. Sci. & Technol., Tsinghua Univ., Beijing, China
fYear :
2001
fDate :
2001
Firstpage :
716
Lastpage :
719
Abstract :
When using the boundary element method (BEM) to calculate the capacitance of three-dimensional VLSI interconnects with multiple dielectrics, a significant error can occur if some dielectrics do not contain a conductor. We present a new algorithm of coupling computation of BEM and the finite difference method (FDM) to resolve the problem. This algorithm still uses BEM for dielectrics which contain conductors, but employs FDM for those without. Then we couple these equations to calculate the capacitance. The numerical results indicate that this algorithm reduces calculation error greatly
Keywords :
VLSI; boundary-elements methods; capacitance; error analysis; finite difference methods; integrated circuit interconnections; integrated circuit modelling; 3D capacitance extraction; BEM; BEM/FDM coupled computation; FDM; boundary element method; finite difference method; multiple dielectrics; numerical results; reduced calculation error; three-dimensional VLSI interconnects; Computer science; Conductors; Dielectrics; Electronic design automation and methodology; Finite difference methods; Integral equations; Integrated circuit interconnections; Mesh generation; Parasitic capacitance; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ASIC, 2001. Proceedings. 4th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-6677-8
Type :
conf
DOI :
10.1109/ICASIC.2001.982664
Filename :
982664
Link To Document :
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