DocumentCode :
2228671
Title :
Solid-state microsensors and smart structures
Author :
Najafi, Khalil ; Mastrangelo, Carlos H.
Author_Institution :
Center for Integrated Sensors & Circuits, Michigan Univ., Ann Arbor, MI
fYear :
1993
fDate :
31 Oct-3 Nov 1993
Firstpage :
341
Abstract :
Solid-state microsensors have been recently developed for the measurement of a number of physical and chemical parameters for use in today´s instrumentation and control systems. This paper reviews the state-of-the-art in the development of silicon micromachining technologies for the fabrication of silicon microsensors. Micromachining technologies such as bulk silicon micromachining, surface micromachining, and electroplating techniques are first reviewed, followed by a discussion of various thin-film materials used in the implementation of required microstructures. Several examples of silicon microsensors, including a 1024-element silicon tactile imager, and a thermally-based pressure and flow sensor, are presented. Finally, a discussion of potential use of these devices in smart structures and systems is presented
Keywords :
electric sensing devices; electroplating; flow measurement; flowmeters; image sensors; integrated circuit technology; intelligent structures; machining; micromechanical devices; pressure sensors; semiconductor device manufacture; silicon; surface treatment; tactile sensors; Si; Si micromachining technologies; Si microsensors; Si tactile imager; bulk Si micromachining; electroplating; fabrication; flow sensor; pressure sensor; smart structures; surface micromachining; Chemical technology; Control systems; Fabrication; Instruments; Intelligent structures; Micromachining; Microsensors; Semiconductor thin films; Silicon; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium, 1993. Proceedings., IEEE 1993
Conference_Location :
Baltimore, MD
Print_ISBN :
0-7803-2012-3
Type :
conf
DOI :
10.1109/ULTSYM.1993.339471
Filename :
339471
Link To Document :
بازگشت