A novel CMOS-compatible inkjet head

Author

Westberg, David ; Andersson, G.I.

Author_Institution

Dept. of Solid State Electron., Chalmers Univ. of Technol., Goteborg, Sweden

Volume

2

fYear

1997

fDate

16-19 Jun 1997

Firstpage

813

Abstract

We propose a new CMOS-compatible fabrication process for miniaturised monolithic thermal inkjet heads. The ink channels are formed by sacrificial removal of metal wires in a standard CMOS process. This simplifies the processing and enables close spacing of the channels. It also allows for easy integration of nozzle and electronics. A demonstrator fabricated using a commercially available CMOS process followed by straightforward postprocessing is presented as well as specially made CMOS compatible structures. Typical dimensions of the channels are 10 μm wide, 0.5-1.5 μm thick, and 300-600 μm long

Keywords

CMOS integrated circuits; arrays; etching; ink jet printers; micromachining; micromechanical devices; nozzles; thermal printers; 0.5 to 1.5 mum; 10 mum; 300 to 600 mum; Al; CMOS-compatible fabrication process; bulk micromachining; channel dimensions; close channel spacing; demonstrator; inkjet nozzle arrays; miniaturised monolithic thermal inkjet heads; sacrificial Al etching; sacrificial metal wire removal; Aluminum; Anisotropic magnetoresistance; CMOS process; Consumer electronics; Dielectrics; Etching; Fabrication; Heating; Ink; Wires;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on

Conference_Location

Chicago, IL

Print_ISBN

0-7803-3829-4

Type

conf

DOI

10.1109/SENSOR.1997.635224

Filename

635224