Title :
InP/InGaAs double heterojunction bipolar transistors with BVCEO = 12 V and fmax = 470 GHz
Author :
Kashio, N. ; Kurishima, K. ; Ida, M. ; Matsuzaki, H.
Author_Institution :
NTT Device Innovation Center, NTT Corp., Atsugi, Japan
Abstract :
0.25 μm emitter InP/InGaAs double heterojunction bipolar transistors (DHBTs) are presented that simultaneously exhibit a high collector current density (Jc) of more than 3 mA/μm2 and high breakdown voltage (BVCEO) of 12 V. The DHBTs consist of a 30 nm-thick InGaAs base, 250 nm-thick InGaAs/InAlGaAs/InP collector and 150 nm-thick n-doped InP field buffer. Since the doping level of the InP field buffer is relatively high, only the InGaAs/InAlGaAs/InP collector is depleted at low VCE. Thus, the DHBTs can provide ft = 173 GHz and fmax = 470 GHz at Jc = 3.5 mA/μm2. On the other hand, at a high VCE, both the InGaAs/InAlGaAs/InP collector and InP field buffer are depleted. Therefore, the effective depletion thickness increases, which results in a BVCEO of 12 V. These results indicate that the use of the InP field buffer provides both high-speed performance and high BVCEO.
Keywords :
III-V semiconductors; aluminium compounds; current density; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor doping; InGaAs-InAlGaAs-InP; doping level; double heterojunction bipolar transistors; effective depletion thickness; field buffer; frequency 470 GHz to 173 GHz; high breakdown voltage; high collector current density; high-speed performance; size 30 nm to 250 nm; voltage 12 V; wavelength 0.25 mum;
Journal_Title :
Electronics Letters
DOI :
10.1049/el.2014.4503