Photocluster productivity improvement

Author

Sisler, S.B.

Author_Institution

Microelectron. Div., IBM Corp., Essex Junction, VT, USA

fYear

1996

fDate

12-14 Nov 1996

Firstpage

13

Lastpage

16

Abstract

This paper describes improvements being implemented in a multi-technology, multi-partnumber IBM semiconductor fabricator to increase photocluster output. The work of various teams is presented, which have generated a host of enhancements, including a customized logistics system, host computer control, continuous lot chaining, a work-in-process (WIP) and reticle tracking system, area alarms for tool stoppages, staffing based on activity analysis, operator coverage improvements guided by delays determined from host control data and alignment assist reductions guided by host control data. Photocluster productivity has increased 35% since these changes were begun and more improvement is anticipated

Keywords

human resource management; integrated circuit manufacture; photolithography; production control; tracking; IBM semiconductor fabricator; activity analysis; alignment assist reductions; area alarms; continuous lot chaining; customized logistics system; delays; operator coverage improvements; photocluster productivity; reticle tracking system; work-in-process system; Control systems; Costs; Delay; Lithography; Logic; Logistics; Manufacturing; Microelectronics; Productivity; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996

Conference_Location

Cambridge, MA

ISSN

1078-8743

Print_ISBN

0-7803-3371-3

Type

conf

DOI

10.1109/ASMC.1996.557963

Filename

557963