Title :
Photocluster productivity improvement
Author_Institution :
Microelectron. Div., IBM Corp., Essex Junction, VT, USA
Abstract :
This paper describes improvements being implemented in a multi-technology, multi-partnumber IBM semiconductor fabricator to increase photocluster output. The work of various teams is presented, which have generated a host of enhancements, including a customized logistics system, host computer control, continuous lot chaining, a work-in-process (WIP) and reticle tracking system, area alarms for tool stoppages, staffing based on activity analysis, operator coverage improvements guided by delays determined from host control data and alignment assist reductions guided by host control data. Photocluster productivity has increased 35% since these changes were begun and more improvement is anticipated
Keywords :
human resource management; integrated circuit manufacture; photolithography; production control; tracking; IBM semiconductor fabricator; activity analysis; alignment assist reductions; area alarms; continuous lot chaining; customized logistics system; delays; operator coverage improvements; photocluster productivity; reticle tracking system; work-in-process system; Control systems; Costs; Delay; Lithography; Logic; Logistics; Manufacturing; Microelectronics; Productivity; Resists;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-3371-3
DOI :
10.1109/ASMC.1996.557963
