DocumentCode
2231146
Title
Three-dimensional laser lithography with conceptually diffraction-unlimited lateral and axial resolution
Author
Fischer, Joachim ; Ergin, Tolga ; Von Freymann, Georg ; Wegener, Martin
Author_Institution
DFG-Center for Functional Nanostruct. (CFN), Karlsruhe Inst. of Technol. (KIT), Karlsruhe, Germany
fYear
2011
fDate
1-6 May 2011
Firstpage
1
Lastpage
2
Abstract
By transferring concepts from stimulated-emission-depletion microscopy to Direct Laser Writing, we improved its lateral and axial resolution significantly. Thus, woodpile photonic crystals with 300-nm lateral rod spacing can be fabricated routinely.
Keywords
laser materials processing; optical fabrication; optical materials; photolithography; photonic crystals; stimulated emission; diffraction-unlimited axial resolution; direct laser writing; optical fabrication; size 300 nm; stimulated-emission-depletion microscopy; three-dimensional laser lithography; woodpile photonic crystals; Lasers; Lithography; Optical device fabrication; Optical diffraction; Photonic crystals; Polymers; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-4577-1223-4
Type
conf
Filename
5950270
Link To Document