Title :
Fabrication of stepped and reflowed 3-D profiles for optical applications by dose-modulated electron beam lithography and selective thermal reflow
Author :
Schift, Helmut ; Schleunitz, Arne
Author_Institution :
Lab. for Micro- & Nanotechnol., Paul Scherrer Inst., Villigen, Switzerland
Abstract :
Microlens and prism arrays were fabricated using multi-level electron beam patterning combined with thermal reflow. The molecular weight dependent processing allows selective transfer of stepped into sloped resist structures with smooth surfaces.
Keywords :
electron beam lithography; microlenses; optical arrays; optical fabrication; optical prisms; resists; dose-modulated electron beam lithography; microlens; molecular weight dependent processing; multilevel electron beam patterning; optical applications; prism arrays; reflowed 3D profiles; selective thermal reflow; sloped resist structures; smooth surfaces; stepped 3D profiles; stepped resist structures; Electron beams; Electron optics; Lenses; Optical device fabrication; Resists; Shape;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4577-1223-4
