Title :
Fabrication of high-NA GaN diffractive microlenses
Author :
Chii-Chang Chen ; Ming-Hung Li ; Chih-Yang Chang ; Gou-Chung Chi ; Jenq-Yang Chang ; Wei-Tai Cheng ; Jui-Hung Yeh ; Chuck Wu
Author_Institution :
Dept. of Phys., Nat. Central Univ., Chung-li, Taiwan
Abstract :
We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.
Keywords :
III-V semiconductors; gallium compounds; masks; microlenses; optical fabrication; sputter etching; GaN; fabrication method; gray-level mask; high-NA GaN diffractive microlens; high-density optical data storage; inductively coupled plasma etching; Etching; Gallium nitride; Lenses; Microoptics; Optical coupling; Optical design; Optical device fabrication; Optical diffraction; Plasma applications; Plasma materials processing;
Conference_Titel :
Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on
Conference_Location :
Lugano, Switzerland
Print_ISBN :
0-7803-7595-5
DOI :
10.1109/OMEMS.2002.1031446
