Title :
Low-threshold whispering-gallery dye lasers by planar and 3D lithography on silicon
Author :
Grossmann, Tobias ; Schleede, Simone ; Hauser, Mario ; Beck, Torsten ; Thiel, Michael ; Von Freymann, Georg ; Mappes, Timo ; Kalt, Heinz
Author_Institution :
Inst. for Appl. Phys., Karlsruhe Inst. of Technol., Karlsruhe, Germany
Abstract :
We report on the planar and three-dimensional (3D) lithographic fabrication and optical characterization of microcavity lasers made of polymers doped with dyes with laser thresholds as low as 3 nJ per pulse at visible wavelengths.
Keywords :
dye lasers; lithography; microcavity lasers; optical fabrication; optical polymers; whispering gallery modes; 3D lithography; Si; microcavity laser; optical characterization; planar lithography; polymers; visible wavelength; whispering gallery dye laser; Microcavities; Optical device fabrication; Optical pumping; Pump lasers; Q factor; Silicon;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4577-1223-4
