DocumentCode
2231258
Title
Low-threshold whispering-gallery dye lasers by planar and 3D lithography on silicon
Author
Grossmann, Tobias ; Schleede, Simone ; Hauser, Mario ; Beck, Torsten ; Thiel, Michael ; Von Freymann, Georg ; Mappes, Timo ; Kalt, Heinz
Author_Institution
Inst. for Appl. Phys., Karlsruhe Inst. of Technol., Karlsruhe, Germany
fYear
2011
fDate
1-6 May 2011
Firstpage
1
Lastpage
2
Abstract
We report on the planar and three-dimensional (3D) lithographic fabrication and optical characterization of microcavity lasers made of polymers doped with dyes with laser thresholds as low as 3 nJ per pulse at visible wavelengths.
Keywords
dye lasers; lithography; microcavity lasers; optical fabrication; optical polymers; whispering gallery modes; 3D lithography; Si; microcavity laser; optical characterization; planar lithography; polymers; visible wavelength; whispering gallery dye laser; Microcavities; Optical device fabrication; Optical pumping; Pump lasers; Q factor; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-4577-1223-4
Type
conf
Filename
5950275
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