Title :
Comparative Optical Techniques for Monitoring Metals in Single-Crystal Silicon
Author :
Wenner, Valerie ; Lowell, John
Author_Institution :
Advanced Micro Devices, Austin, TX
Keywords :
CMOS technology; Charge carrier lifetime; Contamination; Iron; Manufacturing; Mass spectroscopy; Monitoring; Photonic band gap; Pollution measurement; Silicon;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682484
