Title :
A CFD Model for the Pecvd of Silicon Nitride
Author :
Collins, David J. ; Strojwas, Andrzej J. ; White, Daniel, Jr.
Author_Institution :
Department of Electrical and Computer Engineering, Carnegie Mellon University, Pennsylvania
Keywords :
Computational fluid dynamics; Plasma properties; Plasma temperature; Predictive models; Process design; Radio frequency; Semiconductor device modeling; Semiconductor films; Semiconductor process modeling; Silicon;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682487
