Title :
Fabrication of nanophotonic circuit components by thermal nano imprint lithography
Author :
Scheerlinck, Stijn ; Pedersen, Rasmus Haugstrup ; Dumon, Pieter ; Bogaerts, Wim ; Plachetka, Ulrich ; Thourhout, Dries Van ; Baets, Roel ; Kristensen, Anders
Author_Institution :
Photonics Res. Group, Ghent Univ., Ghent
Abstract :
Nanophotonic components are fabricated using thermal nano imprint lithography (NIL). A silicon-on-insulator Mach-Zehnder interferometer with 20 dB extinction ratio is demonstrated. Grating couplers fabricated by a two-step imprint process demonstrate over 14% coupling efficiency.
Keywords :
Mach-Zehnder interferometers; diffraction gratings; integrated optoelectronics; nanolithography; optical couplers; optical fabrication; silicon-on-insulator; soft lithography; Si-SiO2; grating couplers; nanophotonic circuit component fabrication; silicon-on-insulator Mach-Zehnder interferometer; thermal nanoimprint lithography; two-step imprint process; Circuits; Etching; Fabrication; Fiber gratings; Lithography; Optical coupling; Optical fiber couplers; Optical waveguides; Silicon; Substrates; (050.2770) Gratings; (130.3120) Integrated optics devices;
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
