Title :
Micromirrors with electrically tunable curvature
Author :
Liu, W. ; Talghader, J.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Minnesota Univ., USA
Abstract :
Micromirrors with current-controlled curvature have been fabricated and tested. The principle behind the devices is that resistive heating changes the temperature of the micromirrors, causing a change in optical coating stress. For highly symmetric mirrors, the variable stress induces a uniform and reversible change in curvature. The mirrors used in this study were surface-micromachined from polysilicon and had gold coatings. The radius of curvature of a typical mirror could be tuned from 2.5 mm to 8.2 mm over a current-induced temperature range from 22/spl deg/C to 145/spl deg/C (estimated). The corresponding change in focus over this range, as measured by the Seidel parameters of the wavefront, was 0.38/spl lambda/ while the largest aberration (astigmatism) varied from its zero current value by less than 0.02/spl lambda/. These results should be readily extendable to tuning or correcting flat mirrors by changing the design stress of the reflective coating.
Keywords :
aberrations; micromachining; micromirrors; optical films; optical focusing; optical testing; optical tuning; resistance heating; thermal stresses; 2.5 to 8.2 mm; 22 to 145 degC; Au-Si; astigmatism; current induced temperature range; electrically tunable curvature micromirrors; flat mirror correction; focus change; gold coated surface micromachined polysilicon mirrors; micromirror current-controlled curvature; mirror curvature radius tuning; optical aberration; optical coating stress temperature changes; reflective coating design stress; resistive heating; symmetric mirrors; variable stress induced uniform/reversible curvature change; wavefront Seidel parameters; Coatings; Gold; Heating; Micromirrors; Mirrors; Optical devices; Optical surface waves; Stress; Temperature; Testing;
Conference_Titel :
Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on
Conference_Location :
Lugano, Switzerland
Print_ISBN :
0-7803-7595-5
DOI :
10.1109/OMEMS.2002.1031506