DocumentCode :
2232570
Title :
S-shaped negative differential resistance modeling in electro-thermal simulation of phase-change memory programming
Author :
Chen, F. ; Chao, D.S. ; Chen, M.-J. ; Yen, P. ; Yeh, J.-T. ; Lee, C.-M. ; Wang, W.-H. ; Kao, M.-J. ; Tsai, M.-J.
Author_Institution :
Ind. Technol. Res. Inst., Hsinchu
fYear :
2007
fDate :
10-13 Nov. 2007
Firstpage :
67
Lastpage :
70
Abstract :
Electro-thermal modeling has been commonly employed to model the RESET (crystalline-to-amorphous) transition in phase-change memory devices. However, to fully model the SET (amorphous-to-crystalline) transition, it is required to comprehend the S-shaped negative differential resistance (NDR) that precedes the phase transition, as input current is ramped up. Carrier dynamics on nanosecond time scales have been invoked to model the "snapback" phenomenon. To build S-shaped NDR models within commercial electrothermal simulation packages, we consider various resistivity models which may be calibrated to provide a good flt with experimental data. We find that regardless of the model, it is necessary to include a constant offset in the resistivity formula, in order to consistently obtain the observed ON state portion of the l-V curve.
Keywords :
phase change materials; shared memory systems; S-shaped negative differential resistance modeling; electro-thermal simulation; phase-change memory programming; Amorphous materials; Conductivity; Crystallization; Electric resistance; Electrothermal effects; Packaging; Phase change materials; Phase change memory; Probes; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Memory Technology Symposium, 2007. NVMTS '07
Conference_Location :
Albuquerque, NM
Print_ISBN :
978-1-4244-1361-4
Type :
conf
DOI :
10.1109/NVMT.2007.4389949
Filename :
4389949
Link To Document :
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