• DocumentCode
    2232928
  • Title

    Low-Voltage Bulk-Driven Mixers in 45nm CMOS for Ultra-Wideband TX and RX

  • Author

    Schmitz, O. ; Hampel, S.K. ; Orlob, C. ; Tiebout, M. ; Rolfes, I.

  • Author_Institution
    Inst. of Radiofreq. & Microwave Eng., Leibniz Univ. Hannover, Hannover, Germany
  • fYear
    2008
  • fDate
    16-17 Nov. 2008
  • Firstpage
    119
  • Lastpage
    122
  • Abstract
    This paper presents fully differential up-and down-conversion mixers manufactured in a triple well 45 nm standard CMOS process for low voltage UWB TX and RX applications. The proposed circuits both employ the transistor bulk terminal for signal injection. While the RX mixer uses the bulk for switching via threshold voltage modulation, the TX mixer applies the baseband signal to the bulk. Both circuits offer resistive on-chip termination and DC coupled output buffering for measurement purposes. The RX mixer features a maximum conversion gain of 9.4 dB at 2.5 GHz and an input-referred compression point of -13 dBm while the 3-dB low-pass bandwidth is beyond 10 GHz. The TX mixer offers a maximum conversion gain of -8.8 dB at 5.5 GHz and an output-referred compression point of -10.3 dBm. The operational bandwidth ranges from 4.5 GHz to 7 GHz. Both circuits operate at a low voltage power supply of 1.1 V.
  • Keywords
    CMOS integrated circuits; UHF mixers; radio receivers; radio transmitters; ultra wideband technology; CMOS; DC coupled output buffering; bandwidth 4.5 GHz to 7 GHz; differential down-conversion mixers; differential up-conversion mixers; frequency 2.5 GHz; frequency 5.5 GHz; gain -8.8 dB; gain 9.4 dB; input-referred compression point; low-voltage bulk-driven mixers; resistive on-chip termination; signal injection; threshold voltage modulation; transistor bulk terminal; ultrawideband RX; ultrawideband TX; voltage 1.1 V; Bandwidth; Baseband; CMOS process; Circuits; Gain; Low voltage; Manufacturing processes; Pulp manufacturing; Threshold voltage; Ultra wideband technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    NORCHIP, 2008.
  • Conference_Location
    Tallinn
  • Print_ISBN
    978-1-4244-2492-4
  • Electronic_ISBN
    978-1-4244-2493-1
  • Type

    conf

  • DOI
    10.1109/NORCHP.2008.4738295
  • Filename
    4738295