Title :
Reflexion Supported Pyrometric Interferometry: Anew tool for in situ, real time temperature control in semiconductor manufacturing
Author :
Boebel, Friedrich G. ; Moller, Heino ; Preib, Walter
Author_Institution :
Fraunhofer Institute for Integrated Circuits, Germany
Keywords :
Error analysis; Integrated circuit manufacture; Manufacturing processes; Optical films; Optical interferometry; Semiconductor device manufacture; Semiconductor films; Silicon; Temperature control; Ultra large scale integration;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682496
