Hybrid Lithography System Using E-beam Direct Writer And Optical Stepper

Author

Kaneko, Toshio ; Shibata, Yukinobu ; Sakitani, Yoshio ; Kurosaki, Toshiei

Author_Institution

Electronic Device Manufacturing Equipment & Engineering Div., Japan

fYear

1993

fDate

18-19 Oct 1993

Firstpage

142

Lastpage

147

Keywords

Costs; Design automation; Economics; Lithography; Mass production; Optical filters; Resists; Semiconductor devices; Stability; Throughput;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI

Type

DOI

10.1109/ASMC.1993.682500

Filename

682500

Link To Document