Effects of K-rich in the targets and fabrication parameters on 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) films by pulsed laser deposition

Author

Lu, L. ; Xiao, O.Q. ; Sun, Y. ; Zhang, Y.B. ; Zhu, J.G. ; Liu, Y.

Author_Institution

Coll. of Mater. Sci. & Eng., Sichuan Univ., Chengdu, China

fYear

2009

fDate

23-27 Aug. 2009

Firstpage

1

Lastpage

4

Abstract

0.95(K_0.48Na_0.52NbO₃)-0.05(LiSbO₃) (95KNN-5LS) thin films have been fabricated by pulsed laser deposition (PLD) on Pt/Ti/SiO₂/Si substrates. The K-rich in the target and the fabrication parameters on the properties of the films was investigated. The results show that good films can be obtained with the 0.95(K_0.48Na_0.52NbO₃)-0.05(LiSbO₃)-0.0228K₂CO₃ (95KNN-5LS-4.56K) target, and the surface roughness, film orientation, composition and properties of the films are strongly dependent on the oxygen pressure and oblique angle from the plume axial direction in PLD process.

Keywords

lithium compounds; piezoceramics; piezoelectric thin films; potassium compounds; pulsed laser deposition; sodium compounds; surface roughness; (K_0.48Na_0.52NbO₃)-(LiSbO₃)-K₂CO₃; K_0.48Na_0.52NbO₃-LiSbO₃; PLD process; Pt-Ti-SiO₂-Si; Si; film composition; film orientation; oxygen pressure; piezoelectric ceramics; plume axial direction; pulsed laser deposition; surface roughness; thin film fabrication parameters; Ceramics; Fabrication; Optical pulses; Piezoelectric films; Pulsed laser deposition; Rough surfaces; Semiconductor thin films; Sputtering; Substrates; Surface roughness; 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3); pulsed laser deposition (PLD); thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Applications of Ferroelectrics, 2009. ISAF 2009. 18th IEEE International Symposium on the

Conference_Location

Xian

ISSN

1099-4734

Print_ISBN

978-1-4244-4970-5

Electronic_ISBN

1099-4734

Type

conf

DOI

10.1109/ISAF.2009.5307579

Filename

5307579