Title :
Effects of K-rich in the targets and fabrication parameters on 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) films by pulsed laser deposition
Author :
Lu, L. ; Xiao, O.Q. ; Sun, Y. ; Zhang, Y.B. ; Zhu, J.G. ; Liu, Y.
Author_Institution :
Coll. of Mater. Sci. & Eng., Sichuan Univ., Chengdu, China
Abstract :
0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) (95KNN-5LS) thin films have been fabricated by pulsed laser deposition (PLD) on Pt/Ti/SiO2/Si substrates. The K-rich in the target and the fabrication parameters on the properties of the films was investigated. The results show that good films can be obtained with the 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3)-0.0228K2CO3 (95KNN-5LS-4.56K) target, and the surface roughness, film orientation, composition and properties of the films are strongly dependent on the oxygen pressure and oblique angle from the plume axial direction in PLD process.
Keywords :
lithium compounds; piezoceramics; piezoelectric thin films; potassium compounds; pulsed laser deposition; sodium compounds; surface roughness; (K0.48Na0.52NbO3)-(LiSbO3)-K2CO3; K0.48Na0.52NbO3-LiSbO3; PLD process; Pt-Ti-SiO2-Si; Si; film composition; film orientation; oxygen pressure; piezoelectric ceramics; plume axial direction; pulsed laser deposition; surface roughness; thin film fabrication parameters; Ceramics; Fabrication; Optical pulses; Piezoelectric films; Pulsed laser deposition; Rough surfaces; Semiconductor thin films; Sputtering; Substrates; Surface roughness; 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3); pulsed laser deposition (PLD); thin films;
Conference_Titel :
Applications of Ferroelectrics, 2009. ISAF 2009. 18th IEEE International Symposium on the
Conference_Location :
Xian
Print_ISBN :
978-1-4244-4970-5
Electronic_ISBN :
1099-4734
DOI :
10.1109/ISAF.2009.5307579
