Automating after develop inspection

Author

Berezin, Alan ; Schaffer, Diana ; Villarreal, Asael

Author_Institution

Adv. Micro Devices Inc., Austin, TX, USA

fYear

1996

fDate

12-14 Nov 1996

Firstpage

103

Lastpage

106

Abstract

One of the few areas in the semiconductor manufacturing process where a mistake can still be corrected is the photolithography process module. If a faulty resist pattern is detected prior to being permanently etched, the resist pattern can be stripped and re-imaged. Historically, lots were manually inspected prior to leaving the photolithography module (after develop inspection) so as to detect any problems requiring rework. Automated inspections have been widely adopted at the after etch steps and at the films/deposition operations. This paper will describe the successful automation of the after develop inspection operation at AMD Fab 25 in Austin, Texas

Keywords

automatic optical inspection; computer testing; integrated circuit manufacture; integrated circuit testing; photoresists; production testing; AMD Fab 25; after develop inspection; after etch steps; automated inspections; deposition operations; photolithography process module; resist pattern; semiconductor manufacturing process; Automatic control; Etching; Fault detection; Inspection; Instruments; Lithography; Manufacturing processes; Resists; Sampling methods; Scanning electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996

Conference_Location

Cambridge, MA

ISSN

1078-8743

Print_ISBN

0-7803-3371-3

Type

conf

DOI

10.1109/ASMC.1996.557981

Filename

557981