• DocumentCode
    2234212
  • Title

    A New High Density Plasma Etching System Using A Dipole-ring Magnet (DRM)

  • Author

    Ohiwa, Tokuhisa ; Hasegawa, Isahiro ; Sekine, Makoto

  • Author_Institution
    Research and Development Center, Toshiba Corporation, Kawasaki
  • fYear
    1993
  • fDate
    18-19 Oct 1993
  • Firstpage
    148
  • Lastpage
    151
  • Keywords
    Degradation; Etching; Gaussian processes; Magnetic field measurement; Magnetic fields; Magnetic flux leakage; Magnetic semiconductors; Permanent magnets; Plasma applications; Plasma density;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
  • Type

    conf

  • DOI
    10.1109/ASMC.1993.682501
  • Filename
    682501
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2234212