DocumentCode
2236779
Title
Waferside Analysis Technique for GaAs-Based Circuits
Author
Littleton, D. ; Hamada, D.J.M.
Author_Institution
TriQuint Semicond. Inc., Hillsboro
fYear
2007
fDate
14-14 Oct. 2007
Abstract
Analyzing the root-cause of GaAs-based device failures often involves an elaborate process of delayering and/or cross-sectioning to study the failure sites. This paper introduces an innovative analytical approach by looking through the waferside of a circuit thereby gaining access to the underside of the elements of interest. This technique allows a clear view of the underside of the process thus expanding its usefulness in general failure analysis.
Keywords
III-V semiconductors; etching; failure analysis; gallium arsenide; high electron mobility transistors; GaAs; GaAs - Interface; device failure analysis; innovative analytical approach; root-cause analysis; waferside analysis technique; Circuits; Conducting materials; Optical devices; Optical materials; Optical microscopy; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
ROCS Workshop, 2007.[Reliability of Compound Semiconductors Digest]
Conference_Location
Portland, OR
Print_ISBN
978-0-7908-0115-5
Type
conf
DOI
10.1109/ROCS.2007.4391069
Filename
4391069
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