• DocumentCode
    2236779
  • Title

    Waferside Analysis Technique for GaAs-Based Circuits

  • Author

    Littleton, D. ; Hamada, D.J.M.

  • Author_Institution
    TriQuint Semicond. Inc., Hillsboro
  • fYear
    2007
  • fDate
    14-14 Oct. 2007
  • Abstract
    Analyzing the root-cause of GaAs-based device failures often involves an elaborate process of delayering and/or cross-sectioning to study the failure sites. This paper introduces an innovative analytical approach by looking through the waferside of a circuit thereby gaining access to the underside of the elements of interest. This technique allows a clear view of the underside of the process thus expanding its usefulness in general failure analysis.
  • Keywords
    III-V semiconductors; etching; failure analysis; gallium arsenide; high electron mobility transistors; GaAs; GaAs - Interface; device failure analysis; innovative analytical approach; root-cause analysis; waferside analysis technique; Circuits; Conducting materials; Optical devices; Optical materials; Optical microscopy; Scanning electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ROCS Workshop, 2007.[Reliability of Compound Semiconductors Digest]
  • Conference_Location
    Portland, OR
  • Print_ISBN
    978-0-7908-0115-5
  • Type

    conf

  • DOI
    10.1109/ROCS.2007.4391069
  • Filename
    4391069