A low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering

Author

Sheng, Lie-yi ; Tang, Zhenan ; Wu, Jian ; Chan, Philip C.H. ; Sin, Johnny K O

Author_Institution

Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong

Volume

2

fYear

1997

fDate

16-19 Jun 1997

Firstpage

939

Abstract

This paper describes a CMOS compatible integrated gas sensor. The device was designed to make the front-end of the fabrication fully compatible with the standard CMOS process. The non-CMOS compatible fabrication steps were carried out as post-processing steps. This included the silicon anisotropic etch to create the thermally isolated micro-hotplate (MHP) and the deposition of gas-sensitive thin-film. By using maskless RF SnO₂ sputtering, we realized high sensitivity to gases, such as ethanol and hydrogen

Keywords

etching; gas sensors; microsensors; semiconductor materials; sputter deposition; tin compounds; CMOS compatible sensor; SnO₂; anisotropic etch; fabrication front-end; integrated gas sensor; maskless oxide sputtering; post-processing steps; thermally isolated micro-hotplate; Anisotropic magnetoresistance; CMOS process; Fabrication; Gas detectors; Gases; Radio frequency; Semiconductor thin films; Silicon; Sputter etching; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on

Conference_Location

Chicago, IL

Print_ISBN

0-7803-3829-4

Type

conf

DOI

10.1109/SENSOR.1997.635257

Filename

635257