DocumentCode :
2238112
Title :
4.5 kV novel high voltage high performance SiC-FET “SIAFET”
Author :
Sugawara, Y. ; Asano, K. ; Singh, R. ; Palmour, J. ; Takayama, D.
Author_Institution :
Tech. Res. Center, Kansai Electr. Power Co. Inc., Amagasaki, Japan
fYear :
2000
fDate :
2000
Firstpage :
105
Lastpage :
108
Abstract :
A novel high voltage SiC MOS device named SIAFET (Static induction Injected Accumulated FET) is proposed, which has no pn junction in its on-current flow path and has a conductivity modulation by carriers injected from a p+ buried gate. SIAFET with blocking voltage (BV) of 5500 V and specific on-resistance RonS (without the conductivity modulation) of 57 mΩcm2 was designed by using the 6200 V mesa JTE and was fabricated using 4H-SiC substrates. Its basic operation has been confirmed for the first time and it has been demonstrated that its RonS has been shown to reduce to less than 1/6 by SIAFET action. Although its achieved BV is relatively low (2030 V and 4580 V) and its RonS is relatively high (172 mΩcm2 and 387 mΩcm2), RonS of 4580 V SiC-SIAFET is less than 1/25 that of the theoretical RonS limit of Si-MOSFET for this BV
Keywords :
power MOSFET; silicon compounds; wide band gap semiconductors; 4.5 kV; 5500 V; MOSFET; SiC; Static induction Injected Accumulated FET; blocking voltage; carriers injection; conductivity modulation; high voltage high performance SiC-FET; on-current flow path; p+ buried gate; specific on-resistance; Conductivity; FETs; Fabrication; Joining processes; MOS devices; Power semiconductor devices; Silicon carbide; Substrates; TV; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
Conference_Location :
Toulouse
ISSN :
1063-6854
Print_ISBN :
0-7803-6269-1
Type :
conf
DOI :
10.1109/ISPSD.2000.856783
Filename :
856783
Link To Document :
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