Title : 
A new degree of freedom in diode optimization: arbitrary axial lifetime profiles by means of ion irradiation
         
        
            Author : 
Hazdra, P. ; Vobecký, J. ; Galster, N. ; Humbel, O. ; Dalibor, T.
         
        
            Author_Institution : 
ABB Semicond. AG, Lenzburg, Switzerland
         
        
        
        
        
        
            Abstract : 
A novel approach to lifetime control in fast recovery power diodes, arbitrary axial lifetime profiles by single-step ion irradiation, is presented. The principle is based on irradiation through a single mask which is inserted between the ion source and the device. The density and lateral/axial structures of the mask determine the final lifetime profile. Experimental results show that this new technique is fully capable to replace multiple single-energy ion irradiations and to guarantee superior diode performance
         
        
            Keywords : 
carrier lifetime; ion beam effects; power semiconductor diodes; axial lifetime profiles; diode optimization; diode performance; fast recovery power diodes; ion irradiation; lateral/axial structures; lifetime control; Anodes; Charge carriers; Current density; Diodes; Ion sources; Low voltage; Power electronics; Space charge; Switching circuits; Voltage control;
         
        
        
        
            Conference_Titel : 
Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
         
        
            Conference_Location : 
Toulouse
         
        
        
            Print_ISBN : 
0-7803-6269-1
         
        
        
            DOI : 
10.1109/ISPSD.2000.856787