DocumentCode
2238231
Title
Double-helix 3D photo-activation localization microscopy with a phase mask for efficient photon collection
Author
Grover, Ginni ; Quirin, Sean ; Piestun, Rafael
Author_Institution
Dept. of Electr., Comput., & Energy Eng., Univ. of Colorado, Boulder, CO, USA
fYear
2011
fDate
1-6 May 2011
Firstpage
1
Lastpage
2
Abstract
We demonstrate 3D photo-activation localization microscopy of 4μm thick samples with efficient photon collection using a phase mask fabricated by gray-level lithography. The performance limits of the system in the presence of noise are analyzed.
Keywords
lithography; masks; optical elements; optical fabrication; optical microscopy; optical transfer function; double helix 3D photoactivation localization microscopy; gray level lithography; phase mask; photon collection; size 4 mum; Microscopy; Optical imaging; Optical microscopy; Optical sensors; Photonics; Three dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-4577-1223-4
Type
conf
Filename
5950542
Link To Document