• DocumentCode
    2238654
  • Title

    Dielectric charge traps. A new structure element for power devices

  • Author

    Kapels, Holger ; Plikat, Robert ; Silber, Dieter

  • Author_Institution
    Infineon Technol. AG, Munich, Germany
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    205
  • Lastpage
    208
  • Abstract
    The progress in SOI technologies, especially SIMOX and Silicon Direct Bonding, suggests a new type of structural element which could improve device blocking behavior in various aspects. A novel structure element for realizing high breakdown voltages in power devices is analyzed using numerical simulations. We propose dielectric structures which in strong vertical fields collect majority or minority carriers. These structures enable surprising new solutions for various problems. Improved high voltage field plates, surface field reduced Schottky rectifiers, dynamic buffers and Ron improved unipolar devices can be achieved
  • Keywords
    power semiconductor devices; semiconductor device breakdown; silicon-on-insulator; SIMOX; SOI technology; blocking characteristics; breakdown voltage; dielectric charge trap; dynamic buffer; high voltage field plate; numerical simulation; power device; silicon direct bonding; surface field reduced Schottky rectifier; unipolar device; Bonding; Cathodes; Charge carriers; Dielectric devices; Electrons; Numerical simulation; Rectifiers; Silicon; Space charge; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
  • Conference_Location
    Toulouse
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-6269-1
  • Type

    conf

  • DOI
    10.1109/ISPSD.2000.856807
  • Filename
    856807