DocumentCode
2238654
Title
Dielectric charge traps. A new structure element for power devices
Author
Kapels, Holger ; Plikat, Robert ; Silber, Dieter
Author_Institution
Infineon Technol. AG, Munich, Germany
fYear
2000
fDate
2000
Firstpage
205
Lastpage
208
Abstract
The progress in SOI technologies, especially SIMOX and Silicon Direct Bonding, suggests a new type of structural element which could improve device blocking behavior in various aspects. A novel structure element for realizing high breakdown voltages in power devices is analyzed using numerical simulations. We propose dielectric structures which in strong vertical fields collect majority or minority carriers. These structures enable surprising new solutions for various problems. Improved high voltage field plates, surface field reduced Schottky rectifiers, dynamic buffers and Ron improved unipolar devices can be achieved
Keywords
power semiconductor devices; semiconductor device breakdown; silicon-on-insulator; SIMOX; SOI technology; blocking characteristics; breakdown voltage; dielectric charge trap; dynamic buffer; high voltage field plate; numerical simulation; power device; silicon direct bonding; surface field reduced Schottky rectifier; unipolar device; Bonding; Cathodes; Charge carriers; Dielectric devices; Electrons; Numerical simulation; Rectifiers; Silicon; Space charge; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
Conference_Location
Toulouse
ISSN
1063-6854
Print_ISBN
0-7803-6269-1
Type
conf
DOI
10.1109/ISPSD.2000.856807
Filename
856807
Link To Document