DocumentCode :
2238654
Title :
Dielectric charge traps. A new structure element for power devices
Author :
Kapels, Holger ; Plikat, Robert ; Silber, Dieter
Author_Institution :
Infineon Technol. AG, Munich, Germany
fYear :
2000
fDate :
2000
Firstpage :
205
Lastpage :
208
Abstract :
The progress in SOI technologies, especially SIMOX and Silicon Direct Bonding, suggests a new type of structural element which could improve device blocking behavior in various aspects. A novel structure element for realizing high breakdown voltages in power devices is analyzed using numerical simulations. We propose dielectric structures which in strong vertical fields collect majority or minority carriers. These structures enable surprising new solutions for various problems. Improved high voltage field plates, surface field reduced Schottky rectifiers, dynamic buffers and Ron improved unipolar devices can be achieved
Keywords :
power semiconductor devices; semiconductor device breakdown; silicon-on-insulator; SIMOX; SOI technology; blocking characteristics; breakdown voltage; dielectric charge trap; dynamic buffer; high voltage field plate; numerical simulation; power device; silicon direct bonding; surface field reduced Schottky rectifier; unipolar device; Bonding; Cathodes; Charge carriers; Dielectric devices; Electrons; Numerical simulation; Rectifiers; Silicon; Space charge; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
Conference_Location :
Toulouse
ISSN :
1063-6854
Print_ISBN :
0-7803-6269-1
Type :
conf
DOI :
10.1109/ISPSD.2000.856807
Filename :
856807
Link To Document :
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