DocumentCode
2238664
Title
Analytical optimization of the Plasma Clean Cycle for a Nitride PECVD System as evaluated by Cost of Ownership
Author
Langan, John ; Lynn, Sui Yuan ; Huling, Bruce ; Morgan, Russ ; Anderson, Bob ; Behnke, John ; Berman, Michael ; Kobessi, Hassan
Author_Institution
Air Products and Chemicals, Inc.
fYear
1993
fDate
18-19 Oct 1993
Firstpage
229
Lastpage
231
Keywords
Cost function; Mass spectroscopy; Noise measurement; Optimization methods; Plasma applications; Plasma chemistry; Plasma devices; Plasma measurements; Throughput; US Department of Energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
Type
conf
DOI
10.1109/ASMC.1993.682519
Filename
682519
Link To Document