• DocumentCode
    2238717
  • Title

    A 20nm low-power triple-gate multibody 1T-DRAM cell

  • Author

    Gamiz, F. ; Rodriguez, N. ; Cristoloveanu, S.

  • Author_Institution
    Dept. Electron., Univ. of Granada, Granada, Spain
  • fYear
    2012
  • fDate
    23-25 April 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The new concept of Triple-Gate 1T-DRAM cell features N/P body partition that enables the physical separation of hole storage and electron current. The hole concentration controls the partial or full depletion of the N-core. The cell is compatible with ultimate scaling and shows attractive performance (long retention, wide memory window, simple programming, nondestructive reading, and very low-power operation) for embedded systems.
  • Keywords
    DRAM chips; embedded systems; low-power electronics; nanoelectronics; N-core depletion; N/P body partition; electron current; embedded systems; hole concentration; hole storage; low-power triple-gate multibody 1T-DRAM cell; memory window; nondestructive reading; size 20 nm; Bridge circuits; Charge carrier processes; Current density; Doping; Logic gates; Random access memory; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications (VLSI-TSA), 2012 International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    1930-8868
  • Print_ISBN
    978-1-4577-2083-3
  • Type

    conf

  • DOI
    10.1109/VLSI-TSA.2012.6210166
  • Filename
    6210166