DocumentCode :
2238972
Title :
The effect of static and dynamic parasitic charge in the termination area of high voltage devices and possible solutions
Author :
Trajkovic, T. ; Udrea, F. ; Waind, P.R. ; Amaratunga, G.A.J.
Author_Institution :
Dept. of Eng., Cambridge Univ., UK
fYear :
2000
fDate :
2000
Firstpage :
263
Lastpage :
266
Abstract :
Parasitic charge in the passivation layer or at the interface may severely degrade the breakdown capability of high voltage devices. This is attributed to the change of the electric field contours in the presence of the interface charge from an optimal distribution to an unbalanced distribution. A solution to minimise this effect is proposed in this paper. The proposed breakdown termination technique can be used in a wide range of devices such as power MOSFETs, IGBTs or MOS-controlled thyristors and it is especially effective at voltages above 1.2 kV when the n-drift concentration is reduced
Keywords :
MOS-controlled thyristors; electric charge; insulated gate bipolar transistors; interface phenomena; passivation; power MOSFET; power semiconductor devices; protection; semiconductor device breakdown; 1.2 kV; HV devices; IGBTs; MOS-controlled thyristors; breakdown capability; breakdown termination technique; dynamic parasitic charge; electric field contours; high voltage devices; interface charge; n-drift concentration reducetion; optimal distribution; parasitic charge protection termination; passivation layer charge; power MOSFETs; static parasitic charge; termination area; unbalanced distribution; Breakdown voltage; Degradation; Electric breakdown; Insulated gate bipolar transistors; Leakage current; MOSFETs; Passivation; Robustness; Thyristors; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
Conference_Location :
Toulouse
ISSN :
1063-6854
Print_ISBN :
0-7803-6269-1
Type :
conf
DOI :
10.1109/ISPSD.2000.856821
Filename :
856821
Link To Document :
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