DocumentCode :
2239684
Title :
Electromigration reliability enhancement via bus activity distribution
Author :
Dasgupta, Aurobindo ; Karri, Ramesh
Author_Institution :
Dept. of Electr. & Comput. Eng., Massachusetts Univ., Amherst, MA, USA
fYear :
1996
fDate :
3-7 Jun, 1996
Firstpage :
353
Lastpage :
356
Abstract :
Electromigration induced degradation in integrated circuits has been accelerated by continuous scaling of device dimensions. We present a methodology for synthesizing high-reliability and low-energy microarchitectures at the RT level by judiciously binding and scheduling the data transfers of a control data flow graph (CDFG) representation of the application onto the buses in the microarchitecture. The proposed method accounts for correlations between data transfers and the constraints on the number of buses, area and delay
Keywords :
integrated circuit design; RT level; bus activity distribution; control data flow graph; data transfers; electromigration induced degradation; electromigration reliability enhancement; integrated circuits; low-energy microarchitectures; scheduling; Clocks; Conductors; Current density; Design automation; Electromigration; Electrons; Equations; Integrated circuit interconnections; Microarchitecture; Permission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference Proceedings 1996, 33rd
Conference_Location :
Las Vegas, NV
ISSN :
0738-100X
Print_ISBN :
0-7803-3294-6
Type :
conf
DOI :
10.1109/DAC.1996.545600
Filename :
545600
Link To Document :
بازگشت