Title :
Double-layered monolithic silicon photonic crystals
Author :
Mallick, Shrestha Basu ; Kim, Sora ; Hadzialic, Sanja ; Sudbo, Aasmund ; Solgaard, Olav
Author_Institution :
Dept. of Appl. Phys., Stanford Univ., Stanford, CA
Abstract :
Double-layered, self-aligned, silicon photonic crystals are fabricated using directional and isotropic etches - a potential step towards 3D PCs. One structure shows sharper resonances compared to corresponding single layer structure. Another shows high, broadband reflectivity.
Keywords :
elemental semiconductors; etching; materials preparation; photonic crystals; reflectivity; silicon; 3D photonic crystals; Si; broadband reflectivity; monolithic silicon photonic crystals; Anisotropic magnetoresistance; Etching; Fabrication; Oxidation; Personal communication networks; Photonic crystals; Protection; Reflectivity; Resonance; Silicon; 050.6875 Three-dimensional fabrication; 230.5298 Photonic crystals;
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
