Title :
Formation/dissolution of metallic nanoparticles in SiO2 film using cw and ns UV exposure
Author :
Choi, J. ; Massera, J. ; Petit, L. ; Richardson, M. ; Obeng, Y. ; Richardson, K.
Author_Institution :
Coll. of Opt. s/CREOL, Univ. of Central Florida, Orlando, FL
Abstract :
We show the possibility to control the Cu and the Au nanoparticles to precipitate/dissolve selectively in a SiO2 glass matrix using UV/TR light sources with micron resolution. The fabricated/dissolved structures have been characterized using UV-Vis-NIR spectroscopy. A micro- Thermal-analyzer has been used to verify the presence of nanoparticles in the film.
Keywords :
dissolving; nanoparticles; semiconductor thin films; silicon compounds; thermal analysis; ultraviolet radiation effects; ultraviolet spectra; ultraviolet spectroscopy; SiO2; UV-vis-NIR spectroscopy; UV/TR light sources; dissolution; formation; glass matrix; metallic nanoparticles; micron resolution; microthermal-analyzer; precipitate; thin film; Electromagnetic wave absorption; Glass; Gold; Heat treatment; Lamps; Nanoparticles; Optical films; Optical materials; Optical pulses; Ultrafast optics;
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
DOI :
10.1109/CLEOPR.2007.4391260
