DocumentCode
2241185
Title
Size Reduction Technology of SOI-based Nano-waveguides
Author
Sun, F. ; Zhou, Zhengchun
Author_Institution
Div. of Optoelectron. Devices & Integration, Wuhan Nat. Lab. for Optoelectron. (WNLO), Wuhan
fYear
2007
fDate
26-31 Aug. 2007
Firstpage
1
Lastpage
2
Abstract
Based on conventional lithography and anisotropic etching of Si, a size reduction technology is proposed to achieve low-loss nano-scale optical waveguides in silicon-on-insulator (SOI), which would find abroad applications in highly-integrated optical interconnects and integrated photonic circuits.
Keywords
etching; integrated optics; lithography; optical waveguides; silicon-on-insulator; SOI-based nano-waveguides; anisotropic etching; highly-integrated optical interconnects; integrated photonic circuits; low-loss nano-scale optical waveguides; silicon-on-insulator; size reduction technology; Anisotropic magnetoresistance; Etching; Geometrical optics; Integrated circuit technology; Integrated optics; Lithography; Optical interconnections; Optical waveguides; Photonics; Silicon on insulator technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location
Seoul
Print_ISBN
978-1-4244-1173-3
Electronic_ISBN
978-1-4244-1174-0
Type
conf
DOI
10.1109/CLEOPR.2007.4391270
Filename
4391270
Link To Document