DocumentCode
2241746
Title
Influence of the pre-pulse plasma electron density on the performance of elemental copper vapor users
Author
Zhdaneev, O.V.
Author_Institution
Tomsk Polytech. Univ., Russia
fYear
2001
fDate
2001
Firstpage
43
Lastpage
45
Abstract
A computer model for the kinetics in an elemental copper vapor laser (Cu-Ne-H2) has been used to investigate the importance of the pre-pulse electron density on the performance and lasing characteristics of such a device
Keywords
copper; gas lasers; plasma density; reaction kinetics theory; Cu; Cu-Ne-H2; computer model; elemental copper vapor laser; kinetics; lasing characteristics; pre-pulse electron density; Circuits; Conductivity; Copper; Electrons; Fellows; Laser excitation; Metastasis; Plasma confinement; Plasma density; Plasma temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Modern Techniques and Technology, 2001. MTT 2001. Proceedings of the 7th International Scientific and Practical Conference of Students, Post-graduates and Young Scientists
Conference_Location
Tomsk
Print_ISBN
0-7803-6346-9
Type
conf
DOI
10.1109/MTT.2001.983716
Filename
983716
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