DocumentCode :
2242750
Title :
Sub-half micron metallization using high pressure Al
Author :
Rich, P.
Author_Institution :
Thornbury Labs., Electrotech, Bristol, UK
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
78
Lastpage :
81
Abstract :
The continuing drive towards smaller feature sizes increases the demand on multi level metallization. Aluminium plug technology has clear advantages over W-Plug. These include lower resistance vias, fewer overall process steps and better electromigration performance. Conventional Al reflow processes have not gained wide acceptance at, or beyond 0.35 /spl mu/m technology due to their sensitivities to surface conditions and hole profile. High pressure Al filling (Forcefill/sup (R)/), developed by Electrotech, is now becoming the preferred technique for the filling of high aspect ratio structures.
Keywords :
aluminium; high-pressure techniques; integrated circuit metallisation; 0.35 micron; Al; Electrotech; Forcefill; aluminium plug technology; electromigration; high aspect ratio structure; high pressure filling; multilevel metallization; reflow; via resistance; Artificial intelligence; Dielectrics; Electromigration; Filling; Indium phosphide; Inorganic materials; Laboratories; Metallization; Plugs; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1997.621065
Filename :
621065
Link To Document :
بازگشت