Title :
Design of mask grating for obtaining the effect of an off-axis illumination in optical lithography
Author :
Kim, Young-Seok ; Song, Seok Ho ; Oh, Sung-Hyun ; Choi, Yong-Kyu ; O, Beom-Hoan ; Park, Se-Geun ; Lee, El-Hang ; Lee, Seung Gol
Author_Institution :
Sch. of Inf. & Commun. Eng., INHA Univ., Incheon
Abstract :
We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve.
Keywords :
diffraction gratings; light diffraction; optical design techniques; optical fabrication; photolithography; mask grating design; off-axis illumination; optical lithography; photomask; rigorous diffraction theory; simulated Bossung curve; source distribution; Apertures; Design engineering; Design optimization; Diffraction gratings; Frequency; Lighting; Lithography; Optical design; Optical diffraction; Shape;
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
DOI :
10.1109/CLEOPR.2007.4391349
