Title :
High pressure aluminium for sub-micron vias using a liquid transducer
Author :
Jongste, J.F. ; Li, X. ; Lokker, J.P. ; Janssen, G.C.A.M. ; Radelaar, S.
Author_Institution :
Nano Phys. & Technol., Delft Univ. of Technol., Netherlands
Abstract :
Recently, high pressure via-fill has been developed as a new method to manufacture ULSI sub-micron diameter Al contacts with a high aspect ratio. In this paper the fabrication of sub-micron Al vias using silicon oil (polymethylsiloxane) at high pressures is investigated. The high pressure via-fill process is performed on sub-micron diameter contacts patterned in SiO/sub 2/ on Si(100) and covered with a hot-sputtered bridging AlCu(O.5%)Si(1%) film on a Ti/TiN barrier layer. During the process samples are heated to a temperature in the range of 250-400/spl deg/C and pressurized between 60 and 200 MPa using silicon oil as transducer. It is found that in this temperature and pressure range contact-fill is possible.
Keywords :
aluminium; high-pressure techniques; integrated circuit metallisation; transducers; 250 to 400 C; 60 to 200 MPa; Al; ULSI; aluminium; aspect ratio; fabrication; high pressure via-fill; liquid transducer; polymethylsiloxane; silicon oil; sub-micron diameter contact; Aluminum; Compressive stress; Metallization; Petroleum; Silicon; Temperature distribution; Temperature measurement; Tensile stress; Thermal stresses; Transducers;
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
DOI :
10.1109/MAM.1997.621067