Title :
Scanning probe lithography with real time position control interferometer
Author :
Yao, B.C. ; Chien, F.S.-S. ; Chen, S. ; Lui, Paul Kan-Wa ; Peng, G.S.
Author_Institution :
Center for Meas. Stand., Ind. Technol. Res. Inst., Hsinchu, Taiwan
Abstract :
We have constructed an integrated SPM and an xy-position interferometer to properly control the dimensions of the lithography patterns. The tracking error of xy-dimensional positioning system is about 2 nm accuracy and the positioning resolution could reach 0.1 nm. The scanning probe microscope (SPM) oxidation and anisotropic tetra-methyl ammonium hydroxide (TMAH) etching were used to produce smooth and uniform nanopatterns on silicon substrates. The combination of SPM oxidation and real time position control is a promising approach to accurately produce prototyping of functional nano-devices.
Keywords :
atomic force microscopy; etching; nanolithography; oxidation; AFM; anisotropic TMAH etching; functional nano-devices; lithography; nanopattern; oxidation; positioning resolution; scanning probe microscopy; silicon substrates; xy-position interferometer; Atomic force microscopy; Interferometric lithography; Laser feedback; Laser stability; Optical interferometry; Oxidation; Position control; Prototypes; Scanning probe microscopy; Silicon;
Conference_Titel :
Nanotechnology, 2002. IEEE-NANO 2002. Proceedings of the 2002 2nd IEEE Conference on
Print_ISBN :
0-7803-7538-6
DOI :
10.1109/NANO.2002.1032112
