• DocumentCode
    2243728
  • Title

    Ultrashort and ultrabroadband silicon polarization beam splitter based on a bent directional coupler

  • Author

    Dai, Daoxin ; Bowers, John E.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of California, Santa Barbara, CA, USA
  • fYear
    2011
  • fDate
    13-16 Nov. 2011
  • Firstpage
    1
  • Lastpage
    8
  • Abstract
    A novel ultra-short polarization beam splitter (PBS) based on a bent directional coupler is proposed. The bent directional coupler has two bent optical waveguides with different core widths, which is designed to have phase-matching for TM polarization while there is a significant phase-mismatch for TE polarization. Therefore, the TM polarized light can be coupled from the narrow input waveguide to the adjacent wide waveguide while the TE polarization goes through the coupling region without significant coupling. An ultra-short (<;10μm-long) PBS is designed based on silicon-on-insulator nanowires and the length of the bent coupling region is as small as 4.5μm when choosing the gap width as 200nm (large enough to simplify the fabrication). The numerical simulations show that the present PBS has a good fabrication tolerance for the variation of the waveguide width (more than μ60nm) and a very broad band (~200nm) for an extinction ratio of >;10dB.
  • Keywords
    directional couplers; elemental semiconductors; optical beam splitters; optical couplers; optical phase matching; optical waveguides; silicon; silicon-on-insulator; TE polarization; TM polarization; TM polarized light; directional coupler; optical waveguides; phase-matching; silicon-on-insulator nanowires; ultra-short polarization beam splitter; ultrabroadband polarization beam splitter; wavelength 200 nm; wavelength 4.5 mum; Abstracts; Couplings; bending; evanescent coupling; hybrid; laser; microring; silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications and Photonics Conference and Exhibition, 2011. ACP. Asia
  • Conference_Location
    Shanghai
  • ISSN
    2162-108X
  • Print_ISBN
    978-0-8194-8961-6
  • Type

    conf

  • DOI
    10.1117/12.904602
  • Filename
    6210688