DocumentCode :
2243858
Title :
Rapid formation of block copolymer thin film based on infrared laser irradiation
Author :
Tang, Jaw-Luen ; Tsai, Ming-An
Author_Institution :
Dept. of Phys., Nat. Chung Cheng Univ., Chiayi
fYear :
2007
fDate :
26-31 Aug. 2007
Firstpage :
1
Lastpage :
2
Abstract :
A fast and reliable nanofabrication process to prepare thin films of diblock copolymer is essential for enabling their applications in microelectronics. We present a novel technique of shortening self-assembled time significantly by direct exposing diblock copolymer films to a pulsed CO2 laser light.
Keywords :
laser beam effects; laser materials processing; polymer blends; polymer films; self-assembly; block copolymer thin film; diblock copolymer; infrared laser irradiation; microelectronics; nanofabrication; pulsed CO2 laser light; self-assembly; Annealing; Business continuity; Heating; Liquid crystal displays; Optical pulses; Polymer films; Power lasers; Scanning electron microscopy; Self-assembly; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
Type :
conf
DOI :
10.1109/CLEOPR.2007.4391384
Filename :
4391384
Link To Document :
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