DocumentCode :
2245400
Title :
Advances in High-Pulse Energy Excimer Laser and Applications
Author :
Chang, Andrew ; Paetzel, Rainer ; Herbst, Ludolf ; Fechner, Burkhard
Author_Institution :
Coherent, Inc., Santa Clara, CA
fYear :
2007
fDate :
26-31 Aug. 2007
Firstpage :
1
Lastpage :
2
Abstract :
Pulsed excimer lasers offer a unique combination of high pulse energy and short pulse duration in the UV wavelengths. These characteristics combine to provide an exceptional photonics tool for the commercialization of novel applications such as pulsed laser deposition in thin-film manufacturing, LTPS annealing in FPD, surface hardening in automotive, and direct patterning in advanced packaging markets.
Keywords :
excimer lasers; laser materials processing; UV wavelengths; high pulse energy; high-pulse energy excimer laser; photonics tool; pulsed excimer lasers; short pulse duration; Annealing; Automotive engineering; Commercialization; Laser applications; Manufacturing; Optical pulses; Photonics; Pulsed laser deposition; Sputtering; Surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
Type :
conf
DOI :
10.1109/CLEOPR.2007.4391449
Filename :
4391449
Link To Document :
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