Title :
Implementation of phase shift focus monitor under modified illumination [photolithography]
Author :
Nakao, S. ; Miyamoto, Y. ; Maejima, S. ; Ueno, A. ; Yamashita, S. ; Miyazaki, J. ; Tokui, A. ; Tsujita, K. ; Arimoto, I.
Author_Institution :
ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
For the convenience of practical use of phase shift focus monitor (PSFM), imaging characteristics of PSFM are investigated under modified illumination by optical image calculations and printing experiments. Although the mechanism of pattern shift is different from that in conventional high coherent illumination, sufficient sensitivity for precise focus monitoring is predicted by optical image calculation. By experiments, predicted characteristics are observed and similar sensitivity to that in conventional illumination is confirmed.
Keywords :
optical focusing; phase shifting masks; ultraviolet lithography; UV lithography; imaging characteristics; optical image calculation; optical image calculations; pattern shift; phase shift focus monitor; photolithography; printing experiments; Apertures; Diffraction; Focusing; Lighting; Monitoring; Optical imaging; Optical sensors; Optical surface waves; Printing; Wavelength measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984033
