DocumentCode
2247829
Title
Nanohole formation by FIB and its application to biomolecular sensors
Author
Sakamoto, T. ; Kawaura, H.
Author_Institution
Fundamental Res. Labs., NEC Corp., Ibaraki, Japan
fYear
2001
fDate
Oct. 31 2001-Nov. 2 2001
Firstpage
22
Lastpage
23
Abstract
Rapid, reliable, and inexpensive characterisation of biomolecules, particularly nucleic acids and proteins, has become increasingly important. Among the current sensors, engineered transmembrane protein pores have been advantageous candidates for sensing elements. This sensor has two electrolyte-filled pools, which are separated by a lipid bilayer having a protein pore (e.g. /spl alpha/-hemolysin). The specimen molecules place in one of the pools can stochastically pass via the pore. They produce a fluctuating binary response in the transmembrane ionic current (Bezrukov et al, 1994; Li-Qun Gu et al, 1999). Instead of the protein pore, we have proposed use of nanometer-sized holes in a SiN/sub x/ membrane as a sensor head. We have fabricated the biomolecular sensor with nanoholes using a Si bulk micromachining technique (Fertig et al, 2000) and observed the ionic current via nanoholes. Through-nanoholes are formed by FIB (focused ion beam) (Yamaguchi et al, 1985; Gierak et al, 1997).
Keywords
biomolecular electronics; biosensors; focused ion beam technology; ionic conductivity; membranes; micromachining; microsensors; silicon compounds; FIB; Si; Si bulk micromachining technique; SiN; SiN/sub x/ membrane; biomolecular sensor; biomolecular sensors; biomolecules; electrolyte-filled pools; engineered transmembrane protein pores; fluctuating binary response; focused ion beam; ionic current; lipid bilayer; nano-sized holes; nanohole formation; nanoholes; nucleic acids; protein pore; proteins; sensing elements; sensor head; specimen molecules; through-nanoholes; transmembrane ionic current; Biomembranes; Biosensors; Ion beams; Lipidomics; Micromachining; Molecular biophysics; Protein engineering; Reliability engineering; Sensor phenomena and characterization; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location
Shimane, Japan
Print_ISBN
4-89114-017-8
Type
conf
DOI
10.1109/IMNC.2001.984047
Filename
984047
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